Top Page | English | 简体中文 | 繁體中文 | 한국어 | 日本語
Wednesday, 7 February 2018, 13:04 HKT/SGT
Share:
    

Source: Hitachi, Ltd.
Hitachi Joins the Open Invention Network Community

TOKYO, Feb 7, 2018 - (JCN Newswire) - Open Invention Network (OIN), the largest patent non-aggression community in history, and Hitachi, Ltd. (TSE: 6501) announced today that Hitachi has joined as a community member. As an innovation partner for the IoT era through the advanced Social Innovation Business that leverage OT (operational technology) and IT, Hitachi is demonstrating its commitment to open source software as an enabler of innovation across a wide spectrum of industries.

"Hitachi was an early and enthusiastic supporter of open source. It helps businesses modernize their industrial applications with technologies that rely heavily on Linux and embedded Linux, like the Internet of Things (IoT)," said Keith Bergelt, CEO of OIN. "Given its substantial patent holdings, we are pleased that Hitachi has recognized the importance of participating in OIN as part of its IP strategy."

"Open source technology, especially Linux, drives innovation in areas that are critical to the customers that we serve, including technologies such as servers, storage, cloud, converged applications, big data and IoT," said Norihiro Suzuki, Vice President and Executive Officer, CTO of Hitachi. "By joining Open Invention Network, we are demonstrating our continued commitment to open source technology, and supporting it with patent non-aggression in Linux."

OIN's community practices patent non-aggression in core Linux and adjacent open source technologies by cross-licensing Linux System patents to one another on a royalty-free basis. Patents owned by Open Invention Network are similarly licensed royalty-free to any organization that agrees not to assert its patents against the Linux System. The OIN license can be signed online at http://www.j-oin.net/.

About Open Invention Network

Open Invention Network (OIN) is the largest patent non-aggression community in history and supports freedom of action in Linux as a key element of open source software. Funded by Google, IBM, NEC, Philips, Red Hat, Sony, SUSE, and Toyota, OIN has more than 2,400 community members and owns more than 1,200 global patents and applications. The OIN patent license and member cross-licenses are available royalty-free to any party that joins the OIN community. For more information, visit http://www.openinventionnetwork.com.


Contact:
Hitachi Ltd
Corporate Communications
Tel: +81-3-3258-1111


Topic: Press release summary
Source: Hitachi, Ltd.

Sectors: Cloud & Enterprise
http://www.acnnewswire.com
From the Asia Corporate News Network


Copyright © 2024 ACN Newswire. All rights reserved. A division of Asia Corporate News Network.


Hitachi, Ltd. Links

http://www.hitachi.com

https://www.facebook.com/hitachi.global/

https://twitter.com/hitachiglobal?lang=en

https://www.youtube.com/user/HitachiBrandChannel

https://ph.linkedin.com/company/hitachi

Hitachi, Ltd.
Apr 5, 2024 16:15 HKT/SGT
Hitachi Energy and SP Energy Networks to boost renewable energy flow
Apr 5, 2024 16:00 HKT/SGT
Hitachi Selected as "Excellent TCFD Disclosure" by GPIF's External Asset Managers for the Third Consecutive Year
Mar 26, 2024 18:04 HKT/SGT
JFE Steel and Hitachi Jointly Started Providing Solutions for the Steel Industry
Mar 22, 2024 15:04 HKT/SGT
Hitachi Selected as CDP Supplier Engagement Leader for the Third Consecutive Year
Mar 19, 2024 18:11 HKT/SGT
Hitachi Collaborates with NVIDIA to Accelerate Digital Transformation with Generative AI
Mar 19, 2024 11:35 HKT/SGT
Hitachi Vantara Announces Collaboration with NVIDIA to Create New Portfolio of Industrial AI Solutions
Mar 15, 2024 10:21 HKT/SGT
Hitachi High-Tech Launches High-sensitivity and High-throughput Wafer Surface Inspection System LS9300AD for Wafer Manufacturers
Mar 11, 2024 15:44 HKT/SGT
Hitachi Forges a Three Year Strategic Alliance with AWS to Advance Hybrid Cloud Solutions
Feb 15, 2024 10:22 HKT/SGT
Hitachi Energy and TransnetBW make German grid fit for future
Feb 9, 2024 12:41 HKT/SGT
Contributing to Efficient Development of Metal Thin Film Materials by Using Chemicals Informatics and Materials Informatics
More news >>
 News Alerts
Copyright © 2024 ACN Newswire - Asia Corporate News Network
Home | About us | Services | Partners | Events | Login | Contact us | Privacy Policy | Terms of Use | RSS
US: +1 214 890 4418 | Beijing: +86 400 879 3881 | Hong Kong: +852 8192 4922 | Singapore: +65 6549 7068 | Tokyo: +81 3 6859 8575

Connect With us: